Process introduction:(1) Remove O2, CO, CO2, H2O, H2, etc. through physical and chemical adsorption methods. Remove N2 and CH4 through the suction column

(2) The adsorption reactor is heated and regenerated after adsorption, and can be used repeatedly.(3) Multiple columns alternate adsorption and regeneration, and can continuously supply gas.

Application areas:

Integrated circuit manufacturing industrySemiconductor, LED, laser,

solar photovoltaic industrygas industry